Abstract
INTRODUCTION
A current evaluation of the worldwide market for sputtering targets and
sputtered films is also offered, together with an assessment of the market
growth potential over a 5-year period from 2007 through 2012.
The major objectives of this study are:
- Supply an update of the most advanced sputtering methods and emerging
processes.
- Provide an overview of materials commonly used for the fabrication of
sputtering targets and identify new materials.
- Review the latest methods for fabricating sputtering targets.
- Highlight new technological developments in the fabrication of sputtering
targets, while outlining technical issues.
- Review the several fields of applications for sputtering technologies and
investigate emerging applications.
- Estimate current worldwide markets for sputtering targets and sputtering
films, with growth forecasts through 2012 for each market segment.
- Identify important technology and market trends within each market segment.
- Supply an updated review of current producers of sputtering targets.
- Provide a description of current worldwide research activities.
- Determine trends in U.S. and worldwide patents issued during the most
recent years.
SCOPE OF STUDY
This report contains:
- Descriptions of various sputtering target applications including those for
semiconductors, passive components, optical storage media, solar cells,
medical implants and nanostructures
- The current global market status of sputtering targets and sputtered
films, with trends and forecasts for growth over the next 5 years
- Discussion of worldwide research activity
- A review of the latest methods for fabricating sputtering targets
- Company profiles.
- METHODOLOGY AND INFORMATION SOURCES
The technology section of this report is based on information derived from
technical literature, professional journals, author' s field experience, and
online sources.
Global market analysis was performed by analyzing 101 manufacturers of
sputtering targets, accounting for at least 90% of the worldwide market. Data
for each company were obtained by thoroughly analyzing Securities and Exchange
Commission (SEC) filings, Internet Web sites, annual reports, industry
directories, industry magazines and catalogs, government sources, and other
public sources.
Additional data were obtained from the direct contribution of primary sources,
including: company executives, managers, engineers, and other technical
personnel representing manufacturers and developers of sputtering targets and
related materials and process equipment; representatives of academia and trade
associations; and industry market analysts.
Secondary sources of information include:
- EDGAR - U.S. Securities and Exchange Commission Filings
- U.S. Patent and Trademark Office
- European Patent Office
- Company Web Sites
- Company Annual Reports
- Thomas Registers
- Moody' s Directory
- S & P Industry Survey
- Dun & Bradstreet Business Directory
- American Ceramic Society Publications
- Foreign Chamber of Commerce Directories
- Foreign Stock Exchange Listings.
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