Abstract
Displaybank newly published Research Report for the semiconductor industry.
Displaybank plans to publish Report regarding the material which is one of the
key elements in the semiconductor industry focusing especially in the chemical
material related report and has published the third report, ' Semiconductor
Chemical Material Analysis: CVD Liquid Chemical' .
* This report discusses liquid sources like precursor and TEOS used in CVD
(including ALD) process.
Chapter 1. Chemical Vapor Deposition
- Definition of deposition and introduction of process
- Introduction of CVD and discussion of CVD by type (LPCVD, PECVD, MOCVD,
ALD), characteristic, strength and weakness
- Explanation of insulating film deposition and metal thin film deposition
processes, introduction of CVD precursor and low K material
Chapter 2. Major Semiconductor Maker
- List of major semiconductor maker by region (excluding Fabless makers)
- 25 major semiconductor maker information (wafer line capa information and
product category by inch of makers including Intel, Samsung Electronics, TI
and Toshiba)
Chapter 3. Global CVD Liquid Chemical Market Trend
- Half-year based market trend and forecast analysis of ILD Sources
including TEOS, B Source (TEB, TMB), and P Source (TEPO, TMOP) from 2008 to
2011
- Half-year based market trend and forecast analysis of metal thin film
CVD-use source (TiCl4, TDMAT, ALPIS) including Al, Cu, Ti, TiN, and TaN from
2008 to 2011(quantity and revenue based)
- Half-year based market trend and forecast analysis of high K source
(TEMAZr, TEMAHf, TMA) from 2008 to 2011 (quantity and revenue based)
- Half-year based market trend and forecast analysis of above 3 items in
U.S. (North America), Europe, Korea, Japan, Taiwan, China, and other regions
by material from 2008 to 2011 (quantity and revenue based)
Chapter 4. Korea Market Analysis
- Semiconductor information of makers including Samsung Electronics and
Hynix by line (inch, capa, half-year based wafer input, product, line change)
- Usage analysis of ILD source, metal precursor (ALPIS, TiCH4, TDMAT), high
K precursor (TMA, TEMAZr, TEMAHf) by maker' s business site (2008 half-year
based actual usage volume and 2009 half-year based usage volume forecast)
- Maker' s business site based supplier analysis
- Current (Q2' 09 and Q3' 09 based) monthly average usage volume analysis and
supplier of Samsung Electronics and Hynix by individual product (including lab
product supply)
Chapter 5. Market Analysis
- Market summary regarding ILD Source, Metal Precursor, High K Precursor
- Competition composition analysis regarding each item
- Price analysis of each item
- Business issue and flaw analysis of each item
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