Abstract
Description
The large-area TFT-LCD industry, which has surpassed eight-generation lines
and draws investments for 10-generation lines, requires a next-generation
manufacturing process, upgraded from the existing processes, as the substrates
become larger. This is an effort of the industry to make its existing
production process more efficient and reduce TACT time, and thus, cost. The
TFT-LCD industry has determined that it is impossible to keep up with the
performance and price that the market wants with only a drop in the prices of
parts and materials. Therefore, it is investing much in the development of new
technologies.
The TFT-LCD panel manufacturing process is divided into the TFT process, the
Color Filter process (CF), the Cell process, and the Module process. This
report will discuss the TFT Array Patterning process and the C/F manufacturing
process, which are currently being developed.
Chapters 3 and 4 introduce next-generation patterning processes that can be
applied to the TFT Array process. Furthermore, these chapters discuss 3-Mask
Process, which reduced the number of masks used in 4-Mask Process that is
currently developed, and Maskless Exposure process that makes it possible to
perform the exposure process without masks.
Chapter 5 examines the Color Filter on TFT Array process, which forms the
color filter on the TFT array, and Chapters 6 through 11 introduce
next-generation C/F manufacturing processes that can substitute for the
existing Photo Lithography process to produce the C/F. Moreover, these
chapters also discuss the merits and demerits, technical issues and major
manufacturers' development trends in Nano-Imprinting, Roll Printing, and
Inkjet Printing as well as Dry Film Photo Resist Laser Direct Imaging, and
Laser-Induced Thermal Imaging processes.
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