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Market Research Report

Phase Change Memory Enters a New Phase 2nd Edition

Published by Forward Insights Contact us : +1-860-674-8796
Published 2009/10 Content info 78 Pages
Product code FOIN100444
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Description TOC

Table of Contents

CONTENTS

LIST OF FIGURES

LIST OF TABLES

TERMINOLOGY

EXECUTIVE SUMMARY

MEMORY OVERVIEW

  • Introduction
  • The Memory Hierarchy
  • SRAM
    • Concept
    • Technology Evolution
  • DRAM
    • Concept
    • Technology Evolution
  • NOR Flash
    • Concept
    • Technology Evolution
  • NROM
    • Concept
    • Technology Evolution
  • NAND Flash
    • Concept
    • Technology Evolution

PHASE CHANGE MEMORY

  • Introduction
  • Phase Change Material
  • Memory Cell Concept
  • Basic Operation
  • Memory Cell Variations
  • Selection Device
  • PCM Characteristics
    • Set Time
    • Reset Current
    • Endurance
    • Memory Comparison
  • Multi-level Cell PCM
  • Device Layout
  • PCM Reliability
  • PCM Cost Drivers
    • Die Size
    • Process Complexity
  • Technology Scaling
    • Scaling Parameters
    • Roadmap

PCM DEVELOPMENT STATUS

  • PCM Development Status
  • ATMI, Inc.
  • BAE Systems
  • CAMELS
  • Elpida
  • Hynix Semiconductor
  • IBM
  • IMEC
  • ITRI
  • Macronix International
  • Nanochip
  • Numonyx (Intel/ST)
  • NXP Semiconductors
  • Ovonyx
  • Qimonda AG
  • Renesas Technology
  • Samsung Electronics
  • STMicroelectronics
  • ULVAC

MARKET FORECAST

  • PCM as a NOR Replacement
  • PCM as a Non-volatile RAM
  • PCM as a Storage Class Memory
  • Applications
  • Embedded PCM
  • Market

REFERENCES

ABOUT THE AUTHOR

ABOUT FORWARD INSIGHTS

  • Services
  • Contact

REPORT OFFERINGS

List of Figures

  • Figure 1. Memory Hierarchy
  • Figure 2. SRAM Cell Layout
  • Figure 3. 3D SRAM Technology
  • Figure 4. DRAM Cell
  • Figure 5. DRAM Cell Transistor Evolution
  • Figure 6. DRAM Cell Capacitor Trend
  • Figure 7. NOR Flash Cell
  • Figure 8. NOR Architecture
  • Figure 9. NOR Flash Cell
  • Figure 10. NOR Flash Technology Evolution
  • Figure 11. Drain Bias Margin
  • Figure 12. NROM Cell Concept
  • Figure 13. NROM Architecture
  • Figure 14. NROM Cell
  • Figure 15. NROM Technology Evolution
  • Figure 16. Bit Disturb (“Second Bit Effect”)
  • Figure 17. NAND Flash Cell Concept
  • Figure 18. NAND Architecture
  • Figure 19. NAND Cell String
  • Figure 20. NAND Flash Technology Evolution
  • Figure 21. NAND Flash Memory Gap Fill
  • Figure 22. Electrons Stored on the Floating Gate
  • Figure 23. Samsung 32Gb CTF Memory
  • Figure 24. Timeline of Phase Change Memory
  • Figure 25. Periodic Table
  • Figure 26. GST Composition
  • Figure 27. Basic PCM Cell Structure
  • Figure 28. Set Operation
  • Figure 29. Reset Operation
  • Figure 30. Phase Change Memory I-V Curve
  • Figure 31. Memory Array Operation
  • Figure 32. μTrench and Lance Structures
  • Figure 33. Lance and pore structure
  • Figure 34. Phase Change Bridge Memory
  • Figure 35. MOS and BJT Selector
  • Figure 36. Diode Selector
  • Figure 37. Set Time Trend
  • Figure 38. Dependence of Reset Current on Contact Area
  • Figure 39. Reset Current Reduction with Ta2O5 Interfacial Layer
  • Figure 40. Reset Current Trend
  • Figure 41. PCM Endurance
  • Figure 42. Read Access Time Comparison
  • Figure 43. Write Throughput
  • Figure 44. Program Performance Comparison
  • Figure 45. MLC Write Approaches
  • Figure 46. MLC Distribution
  • Figure 47. Multi-level States as a Function of Pulse Tail
  • Figure 48. 16-Level and 4-Level PCM
  • Figure 49. Samsung Phase Change Memory Device Evolution
  • Figure 50. Samsung 90nm 512Mb PRAM Layout
  • Figure 51. ST/Intel Phase Change Memory Device Evolution
  • Figure 52. NOR Flash and PCM Architecture
  • Figure 53. Intel 256Mb 130nm 28F256L18 StrataFlash Organization
  • Figure 54. 128Mb (256Mb MLC) PCM Organization
  • Figure 55. Endurance as a function of Energy per Pulse
  • Figure 56. PCM vs. NOR Flash
  • Figure 57. Phase Change Memory Technology Evolution
  • Figure 58. Samsung PRAM Cell Size Evolution
  • Figure 59. SABEC Process
  • Figure 60. PRAM Module
  • Figure 61. 180nm Process μTrench PCM Process
  • Figure 62. Phase Change Memory with μTrench Cell
  • Figure 63. Scaling Parameters
  • Figure 64. PCM Scaling Challenges
  • Figure 65. Memory Roadmaps
  • Figure 66. Bit Size Trend
  • Figure 67. Density Trend
  • Figure 68. Areal Density Trend
  • Figure 69. Embedded PCM Roadmap
  • Figure 70. U.S. PCM Patents from 1990 to January 2007
  • Figure 71. Radition-hard C-RAM
  • Figure 72. Memory Device Characteristics - 2012
  • Figure 73. PCM in the Memory System
  • Figure 74. Hybrid FTL for NAND/PCM
  • Figure 75. SCM Target Specifications
  • Figure 76. Enterprise Data Systems Memory & Storage
  • Figure 77. SCM Address Translation
  • Figure 78. PCM as an Unified Memory
  • Figure 79. PCM in the Memory Hierarchy
  • Figure 80. $/MB Forecast
  • Figure 81. PCM NOR Replacement Rate
  • Figure 82. Enterprise DRAM TAM
  • Figure 83. Memory Revenue Forecast

List of Tables

  • Table 1. Memory Comparison
  • Table 2. PCM Development Status
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