the-infoshop.com - The vertical markets research portal
View CartView Cart
Global Information, Inc.
US: +1-860-674-8796
EU: +32-2-535-7543
SG: +65-6223-2436
  Home | Category | Publishers | Custom Research | E-mail Alert | About Us | Contact Us | Site Map |
 

* View All Categories
View Conferences
Japanese Korean Chinese

Market Research Report

Sub 100-nm Lithography: Market Analysis and Strategic Issues

Published by The Information Network Contact us : +1-860-674-8796
Published 2009/03 Content info 150 PAGES
Product code IF4961
Price From  US $ 2495 Order/Price list
US $ 2495 PDF by E-mail
US $ 2545 PDF by E-mail & Hard Copy
Delivery Time
PDF by E-Mail
Approx. 1-2 business days
Hard Copy/CD-ROM
Approx. 3-4 business days
If you need expedited delivery, please call us.
Description TOC

Abstract

Each new generation of IC devices brings about a corresponding decrease in linewidths and minimum feature sizes. The technological trends and innovations in IC fabrication processes directly influences the market for microlithography equipment. This market is the most competitive of all front-end semiconductor equipment markets, due to the high price of the equipment and the potential for high profit.

Optical methods of wafer imaging have remained the dominant force in the IC industry, despite claims made by E-beam, X-ray, and focused ion beam equipment manufacturers that even higher resolution is needed for VLSI devices. Two of the main reasons for the continual acceptance of this technology have been system maturity and the development of more effective exposure ultraviolet radiation. The current advances in optical system will eventually reach their limits, resulting in competitive marketing and technology strategies by X-ray vendors for a share of the microlithography market.

American, Japanese, and European suppliers are reviewed in this report, and the market growth is established to 2009 for step-and-scan projection aligners and step-and-repeat aligners. This report also examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are.

Current advances in optical systems could reach their limitation for 4 Gbit devices, but will continue to be a driving force. X-ray technology is being positioned to step in. However, Sematech' s endorsement of EUV will push this technology to the forefront. Advances in optics, phase shift masks, and photoresists are fueling optical lithography and will further complicate the future marketplace.

The primary objective of this report is to review the current issues dealing with lithography as applied to the manufacture of VLSI devices.

Topics specifically covered include:

  • Technology trends
  • Products
  • Applications
  • Suppliers
  • Markets
  • Opportunities and strategies

This report examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are. The worldwide markets are analyzed and projected.

Related Report
Back to Top
Please inform me when related publications are released
InfoWatch

US: 1-860-674-8796 EU: 32-2-535-7543 SG: 65-6223-2436
The vertical markets research portal
© 2009, the-infoshop.com by Global Information, Inc. All rights reserved.