Table of Contents
Executive Summary 1
- E.1 Emerging Challenges for Semiconductor Manufacturing 1
- E.2 New Production Technologies¯Advantages, Disadvantages and Timetables 2
- E.3 New Materials/Technology Platforms for Chips An Alternative to Silicon 4
- E.4 Firms to Watch 5
- E.5 Summary of Forecasts 8
- E.6 Summary of Conclusions 9
Chapter One Introduction 12
- 1.1 Background to Report 12
- 1.2 Objective of this Report 12
- 1.3 Scope of this Report 13
- 1.4 Methodology of this Report 14
- 1.5 Information for this Report 14
- 1.6 Plan of this Report 15
Chapter Two Sources of Manufacturing Challenge and Opportunity 16
- 2.1 Moores Law and the Prob lems of Scaling 16
- 2.2 What, Us Worry? 17
- 2.3 Timescales? 17
- 2.4 Architectural Issues 21
- 2.4.1 Impact of Multicore Processors 22
- 2.4.2 Impact of 3-D Architectures 22
- 2.5 Fab Costs 23
Chapter Three The New "Nano" Production Techniques 25
- 3.1 Introduction 25
- 3.2 Technology and Market Assessment of Alternative Lithography Systems 28
- 3.2.1 Immersion Lithography 28
- 3.2.2 EUV Lithography 30
- 3.2.3 Electron Projection Lithography (EPL) 32
- 3.2.4 Nanoimprint Lithography 33
- 3.3 Direct-write 38
- 3.3.1 Dip-Pen Nanolithography 38
- 3.3.2 E-Beam 41
- 3.4 Deposition and Self-Assembly 46
- 3.4.1 Atomic Layer Deposition 47
- 3.4.2 Self-Assembly 47
- 3.5 Other Approaches 50
Chapter Four New Materials and their Demands on Production 52
- 4.1 Introduction 52
- 4.2 Alternatives to Silicon 54
- 4.3 High and Low-k Materials 55
- 4.4 Carbon Nanotubes and Nanowires 58
- 4.5 Spintronics 62
- 4.6 Molectronics 65
- 4.7 Plastic/Organic Electronics 68
- 4.8 Quantum Dots 70
Chapter Five Eight-Year Forecasts of Next Generation Production Equipment 72
- 5.1 Forecasting Methodology 72
- 5.2 Potential Sources of Error 72
- 5.3 Pricing of Equipment 73
- 5.4 Forecasts 74
Acronyms and Abbreviations Used in this Report 77
About the Author 78
List of Exhibits
- Exhibit E-1 Important Novel Approaches to Semiconductor Manufacturing 3
- Exhibit E-2 New Materials Platforms and their Production Requirements 4
- Exhibit E-3 Summary of Market Forecasts for Semiconductor Manufacturing Equipment Operating at the Nanoscale (excludes conventional photolithography) 9
- Exhibit 2-1 Different Perspectives on Scaling 20
- Exhibit 3-1 Selected NIL Players and Technologies 36
- Exhibit 3-2 Recent End Users of Molecular Imp rints Nanoimprint Lithography Equipment 37
- Exhibit 3-3 Potential Applications for Ink-Jet Printable Electronics 45
- Exhibit 4-1 The Interrelationship Between Materials, Architecture and Production Modes 53
- Exhibit 4-2 Evolution of Nanotube Electronics 59
- Exhibit 4-3 Evolution of Molectronics 67
- Exhibit 5-1 Market Forecasts for Alternative Lithography Technologies 75
- Exhibit 5-2 Market Forecasts for Direct Write Technologies 76
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