Market Research Report
Photomask Characterization Summary - Market Trends/Forecast for the Semiconductor Photomask Industry
| Published by |
SEMI |
|
| Published |
2009/03 |
Content info |
7 Pages |
| Product code |
SEM84300 |
| Price |
From US $ 895  |
|
|
PDF by E-Mail Approx. 1-2 business days
Hard Copy/CD-ROM Approx. 3-4 business days
If you need expedited delivery, please call us.
|
|
Table of Contents
- Methodology and Scope
- Background
- Technology Trends
- Beyond 45-nm
- Market Trends
- Market and Market Outlook
- Summary
Appendices
- Photomasks and Reticle questionnaire
- Summary of Merchant Photomask Supplier Websites
- Figure 1 - 2008 Wafer Fabrication Materials Market
- Figure 2 - Consolidation in the Photomask Industry Since 1986
- Figure 3 - Marketshare Tends in the Photomask Industry
- Figure 4 - Wafer Fab Capacity by Feature Size
- Figure 5 - Key Lithography-related Characteristics by Product
- Figure 6 - Photomask Market Forecast (millions of U.S. dollars)
- Table 1 - List of Photomask Suppliers Contacted for the Photomask
Characterization
- Table 2 - DRAM M11/2 Pitch (nm) Technology Trend Targets
- Table 3 - 32-nm Lithography Technology Adoption and Timing
- Table 4 - Summary of Photomask Suppliers Strategic Relationships
- Table 5 - Regional Photomask market 2003-2011
|
Related Report
|
|
Please inform me when related publications are released
|
|