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[Report]
Chemical Mechanical Polishing Equipment and Materials: A Technical and Market Analysis
Published: 2003/12
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TABLE OF CONTENTS
INTRODUCTION
- STUDY GOALS AND OBJECTIVES
- CONTRIBUTION OF THE STUDY
- FORMAT AND SCOPE
- METHODOLOGY AND INFORMATION SOURCES
- WHO SHOULD SUBSCRIBE?
- RELATED BCC, INC. PUBLICATIONS
- REPORTS
- MONTHLY NEWSLETTERS
- RELATED BCC, INC. INDUSTRY REVIEWS
- RELATED BCC, INC. CONFERENCES
- BCC ONLINE SERVICES
EXECUTIVE SUMMARY
- Summary Table:
WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND OTHER CONSUMABLES, THROUGH 2008
- Summary Figure:
WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND OTHER CONSUMABLES, 2003-2008 ($ MILLIONS)
INDUSTRY OVERVIEW
- SEMICONDUCTOR APPLICATIONS
- MEMORY DEVICE APPLICATIONS
- MARKETS
- Table 1 WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT AND CONSUMABLES, 2002-2008
- Figure 1 MARKET SHARES FOR CMP AND POST-CMP EQUIPMENT AND CONSUMABLES, 2003 AND 2008 (%)
- Table 2 MARKET SHARES ACCORDING TO REGION, 2003 (%)
- Figure 2 WORLDWIDE CMP MARKETS ACCORDING TO REGIONS, 2003 (%)
- Table 3 GLOBAL PRODUCERS OF CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND CMP PAD CONDITIONERS
- Table 3 (CONTINUED)
- Table 4 WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, SLURRY, CHEMICALS, PADS, PAD CONDITIONERS AND FILTERS, THROUGH 2008 ($ MILLIONS)
TECHNOLOGY OVERVIEW
- POLISHING AND PLANARIZATION
- CHEMICAL MECHANICAL PLANARIZATION (CMP)
- Figure 3 CMP PROCESS
- TYPES OF CMP PROCESSES
- INTER-LAYER CMP
- DRY-IN DRY-OUT OR DRY-IN WET-OUT SYSTEMS
- SHALLOW TRENCH ISOLATION
- DAMASCENE
CMP EQUIPMENT
- CLEANING AND PLANARIZING
- NEW DEVELOPMENTS
- INTERCONNECT TECHNOLOGY GOES BEYOND THE 90-NM BARRIER
- NOVA MEASURING INSTRUMENTS GRANTED TWO PATENTS
- APPLIED MATERIALS AWARDED PATENT IN CMP ENDPOINT DETECTION TECHNOLOGY
- INTEL PLANS NEW CHIP DESIGN CENTER IN TAIWAN
- CMP EQUIPMENT INDUSTRY STRUCTURE
- COMPANY PROFILES
- Applied Materials, Inc. (Continued)
- Lam Research Corp. (Continued)
- Lam Research Corp. (Continued)
- Lapmaster International - U.S.
- Nova Measuring Instruments, Ltd.
- Okamoto Machine Tool Works, Ltd.
- SpeedFam International, Inc.
- Double-side Lapping Machines
- Wafer Planarization Systems
- ACQUISITIONS, MERGERS AND JOINT AGREEMENTS
- Semitool and SpeedFam Form Technical Alliance for Copper CMP
- Strasbaugh and Lam Research in Strategic Agreement
- Novellus Acquires Speedfam-IPEC
- MARKETS FOR CMP EQUIPMENT
- SEMICONDUCTOR MARKETS
- Overall Revenue Comparisons
- Industry Revenue History and Forecast
- Table 5 SEMICONDUCTOR INDUSTRY REVENUES, HISTORY AND FORECAST, THROUGH 2008 ($ BILLIONS)
- SEMICONDUCTOR EQUIPMENT MARKET
- CMP EQUIPMENT MARKET
- Copper Chip Technology/Applied Materials
- Monitoring and Control Capabilities
- Market History and Forecast
- Table 6 CMP EQUIPMENT REVENUES, THROUGH 2008 ($ MILLIONS)
- Market Share of Companies
- Table 7 CMP EQUIPMENT - MARKET SHARE OF COMPANIES IN 2003 (%)
- THE POST-CMP EQUIPMENT MARKET
- The Post-CMP Equipment Market (Continued)
- Table 8 POST-CMP EQUIPMENT MARKET, THROUGH 2008 ($ MILLIONS)
- Wet Process Post-CMP Equipment
- Dry and Other Process Post-CMP Equipment
- COMBINED CMP AND POST-CMP EQUIPMENT MARKET
- Table 9 COMBINED CMP AND POST-CMP EQUIPMENT MARKET, THROUGH 2008 ($ MILLIONS)
- TECHNOLOGY CHANGES AND IMPACT ON CMP
- Copper Interconnect and Lower k Value
- Wafer Shortage, Seen Ahead
- Wafer Shortage, Seen Ahead (Continued)
CMP SLURRIES
- FORM AND DELIVERY
- TYPES
- OXIDE CMP SLURRY
- Fumed and Colloidal Slurries
- Production and Processing Requirements
- Table 10 REQUIREMENTS OF CMP SLURRIES
- Table 11 TYPICAL OXIDE CMP SLURRY CHARACTERISTICS
- Table 12 OXIDE CMP PERFORMANCE REQUIREMENTS, 1998 THROUGH 2000
- METAL AND COPPER CMP SLURRY
- Production and Processing Requirements
- Production and Processing Requirements (Continued)
- Materials Requirements and Formulations
- Table 13 TYPICAL COPPER CMP SLURRY COMPOSITION
- Technical Requirements and Challenges
- NEW DEVELOPMENTS
- U.S. DEVELOPMENTS
- Praxair and Bayer Co-Develop Colloidal Silica CMP Slurries
- Spinel Particle Slurry Avoids Scratching
- Cabot Improves CMP Dielectric Slurry for Tenfold Reduction in Microscratches
- Thomas West's CMP Polishing Pad Cuts Slurry Use By Half
- Two U.S. Patents to Arch Microelectronic Materials for Copper CMP Slurries
- DEVELOPMENTS OUTSIDE THE U.S.
- Hitachi's Abrasive-Free Polishing Eases Switch to Copper Chips
- MgO Slurry Polishes without Liquid Oxidant
- Toshiba Develops CMP Slurry Containing Silicon Nitride Nanoparticles
- Two-Step CMP Process Boosts Throughput
- CMP SLURRY INDUSTRY STRUCTURE
- Table 14 PRODUCERS OF ABRASIVE PARTICLES AND SLURRIES FOR PRECISION POLISHING AND CMP
- COMPANY PROFILES
- Air Products Electronics Division
- Baikowski International Corp.
- Cabot Microelectronics Corp.
- DuPont Air Products/DA NanoMaterials, LLC
- Dupont Air Products/DA Nanomaterials, LLC (Continued)
- DuPont EKC Technology, Inc.
- Dupont EKC Technology, Inc. (Continued)
- EKA Chemicals Colloidal Silica Group
- Hitachi Chemical Co., Ltd.
- Moyco Precision Abrasives, Inc.
- Nissan Chemical Industries, Ltd.
- Praxair Surface Technologies, Inc.
- RECENT ACQUISITIONS, LICENSING AND JOINT VENTURES
- Motorola, DA NanoMaterials Team to Market Slurry
- Rodel to Supply Eternal Chemical's Copper CMP Slurry
- Companies Form Alliances to Develop and Commercialize Slurry-Free CMP
- Nanophase Gets Foot into CMP Business as Rodel Supplier
- Air Products Acquires ASC Business Unit
- PATENT DISPUTES
- CMP SLURRY MARKETS
- APPLICATIONS
- SLURRY PRICES
- Table 15 2002 CMP SLURRY PRICES ($/GALLON)
- MARKET SHARE OF COMPANIES
- Table 16 MARKET SHARE OF COMPANIES IN CMP SLURRIES, 2002 (%)
- Figure 4 MARKET SHARE OF COMPANIES IN CMP SLURRIES, 2002 (%)
- BARRIER TO ENTRY AND KEY SUCCESS FACTORS
- MARKETS AND FORECASTS
- Revised Growth Rate Estimates
- Slurry Consumption Value 2001 to 2002
- Slurry Consumption Value 2002 to 2008
- Table 17 PRICE AND VOLUME CONSUMPTION OF CMP SLURRIES, THROUGH 2008
- Table 18 WORLD MARKET FOR CMP SLURRIES, THROUGH 2008
- Figure 5 SHARE OF CMP SLURRIES BY TYPE, 2003 AND 2008 (%)
- Table 19 WORLD MARKET FOR CMP SLURRIES BY APPLICATION, THROUGH 2008
CMP CONSUMABLES-CHEMICALS, PADS, PAD CONDITIONERS AND FILTERS
- Table 20 OTHER CHEMICAL REQUIREMENTS FOR CMP, THROUGH 2008 ($ MILLIONS)
- PADS, PAD CONDITIONERS, FILTERS
- CMP PADS
- CMP PAD CONDITIONERS
- FILTERS FOR CMP
- NEW DEVELOPMENTS
- Rodel Partners with Kinik to Co-Develop and Market CMP Pad Conditioners
- P.B.S.® Brand Bonding System for Pad Conditioners
- Rodel Enhances IC1000 CMP Pad Offerings
- Diamond Grid CMP Pad Dresser Boosts CMP Productivity
- Rodel's New Pad Lowers Polishing Defects
- Thomas West Introduces Improved CMP Pad
- Factors Influencing CMP Pad Conditioner Performance
- Diamonex Introduces Diabond
- JSR Corp. Commissions New CMP Pad Manufacturing Facility
- Silterra Reduces Consumable Cost with New Pad
- INDUSTRY STRUCTURE/COMPANY PROFILES
- Abrasive Technology, Inc.
- Air Products Electronics Division
- Dainippon Screen Mfg. Co., Ltd.
- Daitron Machinery Division
- Frontier Semiconductor Measurements, Inc.
- Freudenberg Vliesstoffe Kg
- Intelligent Enclosure Corp.
- Kinik-Sales (Thailand) Co., Ltd.
- Okamoto Machine Tool Works, Ltd.
- Semiconductor Production Systems
- Universal Photonics, Inc.
- MARKET PLAYERS AND LEADERS
- Table 21 PRODUCERS OF CMP PADS AND PAD CONDITIONERS
- Table 21 (CONTINUED)
- Table 22 CMP PAD SUPPLIERS AND THEIR MARKET SHARE, 2002 (%)
- Table 23 MARKETS FOR CMP PADS, PAD CONDITIONERS AND FILTERS, THROUGH 2008 ($ MILLIONS)
- Table 24 WORLD MARKET FOR CMP PADS ACCORDING TO PAD TYPES, THROUGH 2008
APPENDIX I
- USERS OF CMP EQUIPMENT, SLURRIES AND CONSUMABLES
- ADVANCED MICRO DEVICES (AMD)
- ANALOG DEVICES, INC.
- APPLIED MICRO CIRCUITS CORP. (AMCC)
- ATMEL CORP.
- BEIJING XUNCHUANG IC CO., LTD.
- CHARTERED SEMICONDUCTOR MANUFACTURING
- CHIPPAC, INC.
- CYPRESS SEMICONDUCTOR
- DALLAS SEMICONDUCTOR CORP.
- FUJITSU, INC.
- GRACE SEMICONDUCTOR MANUFACTURING CORP. (GSMC)
- HEWLETT-PACKARD
- HITACHI
- HOLMATE SEMICONDUCTOR INC.
- HOLTEK SEMICONDUCTOR
- HUAHONG NEC
- HUAXIA SEMICONDUCTOR MANUFACTURING CO., LTD.
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- IBM MICROELECTRONICS
- INFINEON TECHNOLOGIES AG
- INFINEON TECHNOLOGIES RICHMOND
- INTEGRATED DEVICE TECHNOLOGY (IDT)
- INTEL
- INTERSIL CORP.
- LSI LOGIC CORP.
- LUCENT TECHNOLOGIES
- MICRON TECHNOLOGY
- MITSUBISHI ELECTRIC SEMICONDUCTOR GROUP
- MAXIM INTEGRATED CIRCUITS
- MOSEL-VITELIC
- MOTOROLA
- NATIONAL SEMICONDUCTOR CORP.
- NANTONG FUJITSU MICROELECTRONICS CO., LTD.
- NIPPON ELECTRIC CORP. (NEC)
- PHILIPS SEMICONDUCTORS
- RENESAS TECHNOLOGY CORP.
- RICOH CO., LTD.
- SAMSUNG ELECTRONICS CO. LTD.
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORP. (SMIC)
- SHANGHAI HONGLI SEMICONDUCTOR MANUFACTURING CO.
- ST MICROELECTRONICS N.V.
- SHARP CORP.
- SHARP ELECTRONICS CORP. U.S.A.
- SIEMENS AG
- SILTERRA
- SHANGHAI HUA HONG NEC ELECTRONICS, LTD.
- SONY SEMICONDUCTOR COMPANY OF AMERICA
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TSMC)
- TEXAS INSTRUMENTS
- TOSHIBA CORP.
- UNITIVE ADVANCED SEMICONDUCTOR PACKAGING
- UNITIVE SEMICONDUCTOR TAIWAN CORP.
- UNITRODE COPORATION/TEXAS INSTRUMENTS
- VANGUARD INTERNATIONAL SEMICONDUCTOR CORP.
- VLSI TECHNOLOGY
- WAFERTECH
- WINBOUND ELECTRONICS CORP.
- WORLDWIDE SEMICONDUCTOR MANUACTURING CORP.
LIST OF TABLES
- Summary Table:
WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND OTHER CONSUMABLES, THROUGH 2008
- Table 1 WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT AND CONSUMABLES, 2002-2008
- Table 2 MARKET SHARES ACCORDING TO REGION, 2003 (%)
- Table 3 GLOBAL PRODUCERS OF CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND CMP PAD CONDITIONERS
- Table 4 WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, SLURRY, CHEMICALS, PADS, PAD CONDITIONERS AND FILTERS, THROUGH 2008 ($ MILLIONS)
- Table 5 SEMICONDUCTOR INDUSTRY REVENUES, HISTORY AND FORECAST, THROUGH 2008 ($ BILLIONS)
- Table 6 CMP EQUIPMENT REVENUES, THROUGH 2008 ($ MILLIONS)
- Table 7 CMP EQUIPMENT - MARKET SHARE OF COMPANIES IN 2003 (%)
- Table 8 POST-CMP EQUIPMENT MARKET, THROUGH 2008 ($ MILLIONS)
- Table 9 COMBINED CMP AND POST-CMP EQUIPMENT MARKET, THROUGH 2008 ($ MILLIONS)
- Table 10 REQUIREMENTS OF CMP SLURRIES
- Table 11 TYPICAL OXIDE CMP SLURRY CHARACTERISTICS
- Table 12 OXIDE CMP PERFORMANCE REQUIREMENTS, 1998 THROUGH 2000
- Table 13 TYPICAL COPPER CMP SLURRY COMPOSITION
- Table 14 PRODUCERS OF ABRASIVE PARTICLES AND SLURRIES FOR PRECISION POLISHING AND CMP
- Table 15 2002 CMP SLURRY PRICES ($/GALLON)
- Table 16 MARKET SHARE OF COMPANIES IN CMP SLURRIES, 2002 (%)
- Table 17 PRICE AND VOLUME CONSUMPTION OF CMP SLURRIES, THROUGH 2008
- Table 18 WORLD MARKET FOR CMP SLURRIES, THROUGH 2008
- Table 19 WORLD MARKET FOR CMP SLURRIES BY APPLICATION, THROUGH 2008
- Table 20 OTHER CHEMICAL REQUIREMENTS FOR CMP, THROUGH 2008 ($ MILLIONS)
- Table 21 PRODUCERS OF CMP PADS AND PAD CONDITIONERS
- Table 22 CMP PAD SUPPLIERS AND THEIR MARKET SHARE, 2002 (%)
- Table 23 MARKETS FOR CMP PADS, PAD CONDITIONERS AND FILTERS, THROUGH 2008 ($ MILLIONS)
- Table 24 WORLD MARKET FOR CMP PADS ACCORDING TO PAD TYPES, THROUGH 2008
LIST OF FIGURES
- Summary Figure:
WORLDWIDE MARKETS FOR CMP AND POST-CMP EQUIPMENT, CMP SLURRIES, CMP PADS AND OTHER CONSUMABLES, 2003-2008 ($ MILLIONS)
- Figure 1 MARKET SHARES FOR CMP AND POST-CMP EQUIPMENT AND CONSUMABLES, 2003 AND 2008 (%)
- Figure 2 WORLDWIDE CMP MARKETS ACCORDING TO REGIONS, 2003 (%)
- Figure 3 CMP PROCESS
- Figure 4 MARKET SHARE OF COMPANIES IN CMP SLURRIES, 2002 (%)
- Figure 5 SHARE OF CMP SLURRIES BY TYPE, 2003 AND 2008 (%)
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[Report]
Chemical Mechanical Polishing Equipment and Materials: A Technical and Market Analysis
Published: 2003/12
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Published by : BCC Research  |
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Price:
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Product Code : BC17115 |
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