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[Report]

Sub 100-nm Lithography: Market Analysis and Strategic Issues

Published: 2007/12

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Table of Contents

Abstract

Each new generation of IC devices brings about a corresponding decrease in linewidths and minimum feature sizes. The technological trends and innovations in IC fabrication processes directly influences the market for microlithography equipment. This market is the most competitive of all front-end semiconductor equipment markets, due to the high price of the equipment and the potential for high profit.

Optical methods of wafer imaging have remained the dominant force in the IC industry, despite claims made by E-beam, X-ray, and focused ion beam equipment manufacturers that even higher resolution is needed for VLSI devices. Two of the main reasons for the continual acceptance of this technology have been system maturity and the development of more effective exposure ultraviolet radiation. The current advances in optical system will eventually reach their limits, resulting in competitive marketing and technology strategies by X-ray vendors for a share of the microlithography market.

American, Japanese, and European suppliers are reviewed in this report, and the market growth is established to 2009 for step-and-scan projection aligners and step-and-repeat aligners. This report also examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are.

Current advances in optical systems could reach their limitation for 4 Gbit devices, but will continue to be a driving force. X-ray technology is being positioned to step in. However, Sematech's endorsement of EUV will push this technology to the forefront. Advances in optics, phase shift masks, and photoresists are fueling optical lithography and will further complicate the future marketplace.

The primary objective of this report is to review the current issues dealing with lithography as applied to the manufacture of VLSI devices.

Topics specifically covered include:

  • Technology trends
  • Products
  • Applications
  • Suppliers
  • Markets
  • Opportunities and strategies

This report examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are. The worldwide markets are analyzed and projected.

Table of Contents

[Report]
Sub 100-nm Lithography: Market Analysis and Strategic Issues
Published: 2007/12
Published by : The Information Network The Information Network

Price:
US $ 2,495.00 PDF by E-mail
US $ 2,545.00 PDF by E-mail & Hard Copy
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Product Code : IF4961
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