Mask Making, Inspection, & Repair: Market Analysis and Strategic Issues

Table of Contents

Chapter 1 Introduction

• 1.1 The Need For This Report

Chapter 2 Executive Summary

• 2.1 Summary of Major Issues
• 2.2 Summary of Market Opportunities

Chapter 3 Technology Issues

• 3.1 Mask Making
  • 3.1.1 Mask Blanks
  • 3.1.2 Completed Masks
• 3.2 Mask Making Equipment
  • 3.2.1 Electron Beam Systems
  • 3.2.2 Laser Pattern Generators
• 3.3 Mask Inspection
  • 3.3.1 Mask Defects
    • Transmission Variations
    • Transparent Defects
    • Nuisance Defects
    • CD Variations
    • Reflectivity Variations
• 3.4 Mask Repair
  • 3.4.1 Laser Repair
  • 3.4.2 Focused Ion Beam Repair
  • 3.4.3 Other Repair Methods

Chapter 4 User - Vendor Strategies

• 4.1 Establishing User Needs
  • 4.1.1 Mask Making - Merchant or Captive
  • 4.1.2 Submicron Mask Making
    • Equipment - Laser vs E-Beam
  • 4.1.3 Mask Inspection Equipment
  • 4.1.4 Mask Repair - Laser vs FIB
  • 4.1.5 Phase-Shift Masks
  • 4.1.6 Optical Proximity Correction
  • 4.1.7 NGL Technology Challenges
    • 4.1.7.1 X-Ray Masks
    • 4.1.7.2 EPL Masks
    • 4.1.7.3 EUVL Masks
• 4.2 Competitive Vendor Opportunities

Chapter 5 Market Forecast

• 5.1 Driving Forces
  • 5.1.1Introduction
  • 5.1.2Trends in IC Processing Technology
  • 5.1.3 Mask and Reticle Requirements
  • 5.1.4 Fast Turnaround Devices
  • 5.1.5 Impact of Direct Write E-Beam and X-Ray
• 5.2 Market Forecast Assumptions
• 5.3 Mask Making, Inspection, and Repair
  • 5.3.1 Completed Mask Market
  • 5.3.2 Reticle/Mask Manufacturing Equipment

LIST OF FIGURES

• 3.1 Light Transmittance of Glasses
• 3.2 Photomask Fabrication Flow
• 3.3 Optical Photomask Fabrication Flow
• 3.4 SCAPLEL Photomask Fabrication Flow
• 3.5 MaskRigger Software in a Mask Fabrication Process
• 3.6 Schematic of a Laser Pattern Generator
• 3.7 Mulith Reference Distribution Aerial Image Formation
• 3.8 Die-to-Die and Die-to-Database Inspection
• 3.9 Percentage Of Yield Losses
• 3.10 Yield Loss Mechanism
• 3.11 Photomask Repair Methods
• 3.12 Schematic of a Focused Ion Beam System
• 3.13 Illustration of Clear and Opaque Mask Repair
• 4.1 Write Time Versus Device Complexity
• 4.2 Subwavelength Gap
• 4.3 Phase-Shifting Masks
• 4.4 iN Phase Mask Design
• 4.5 Illustration of OPC
• 4.6 Main NGL Mask Formats
• 4.7 Mask Costs Versus Feature Size
• 5.1 Production Costs for Maskmaking
• 5.2 Capital Expenditures and Revenues
• 5.3 Photomask Functionality
• 5.4 North American Merchant Mask Making Market Shares
• 5.5 European Merchant Mask Making Market Shares
• 5.6 Worldwide Merchant Mask Making Market Shares
• 5.7 Pacific Rim Merchant Mask Making Market Shares
• 5.8 Japan Merchant Mask Making Market Shares
• 5.9 Worldwide Mask Making Equipment Market Shares
• 5.10 Mask Inspection Market Shares
• 5.11 Mask Metrology Market Shares

LIST OF TABLES

• 4.1 FIB and Laser Repair Comparison
• 4.2 Advanced Optical Lithographic Scenarios
• 4.3 NGL Mask Formats
• 4.4 Cost of Reticle/X-Ray Mask
• 4.5 Phase Shift Mask and X-Ray Mask Manufacturing
• 5.1 Overall Roadmap of Technology Characteristics
• 5.2 Roadmap of Mask Inspection
• 5.3 IC Lithographic Requirements
• 5.4 Increasing Mask Complexity
• 5.5 Worldwide Mask Making Market by Feature Size
• 5.6 Captive Mask Shops
• 5.7 Worldwide Mask Making Equipment Market Forecast
• 5.8 Worldwide Mask Making Equipment Market Shares
• 5.9 Mask Inspection Market Forecast
• 5.10 Mask Metrology Market Forecast